C -> C

• Sputtering yield [1], [2], [3]
• Sputtered energy [1], [2], [3]

• Particle reflection coefficient [1], [2], [3]
• Energy reflection coefficient [1], [2], [3]

• Average depth of implantation [1], [2], [3]

• Maxwellian velocity distribution of incidence [Vsh=0 kT], [Vsh=3 kT], [Vsh=9 kT]

¹³C -> ¹²C

• Sputtering yield
• Sputtered energy

• Particle reflection coefficient [1]
• Energy reflection coefficient [1]

• Average depth of implantation

• Maxwellian velocity distribution of incidence