D -> Be

• Sputtering yield [1]
• Sputtered energy [1]

• Particle reflection coefficient [1]
• Energy reflection coefficient [1]

• Average depth of implantation [1]

• Maxwellian velocity distribution of incidence [Vsh=3 kT]
• Maxwellian energy distribution at a fixed angle of incidence [alpha=0/Vsh=0 kT], [alpha=60/Vsh=0 kT], [alpha=0/Vsh=3 kT], [alpha=60/Vsh=3 kT]